Projection electron lithographic procedure

Details Projection electron lithographic procedure Projection electron lithographic procedure

1992-12-16

1994-01-18

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Transfer procedure between image and image layer, image...

Diffusion transfer process, element, or identified image...

430 5, 430269, 430270, 430320, 430311, 430395, 430494, 430966, G03F 900

Patent

active

052799255

ABSTRACT:
It has been found that for a SCALPEL lithographic system thermal effects dictate that the acceleration voltage for the exposing electrons be maintained within a specific range. This range depends on a variety of factors but is generally in the 50 to 150 KeV region. Additionally, thermal considerations also dictate the method of scanning the mask to print an entire wafer.

REFERENCES:
patent: 5079112 (1992-01-01), Berger et al.
patent: 5217831 (1993-01-01), White
patent: 5299255 (1993-07-01), White

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