Projection apparatus for projecting a pattern formed on a...

Details Projection apparatus for projecting a pattern formed on a... Projection apparatus for projecting a pattern formed on a...

2006-04-25

2006-04-25

Lee, John R. (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S492100, C250S492200

Reexamination Certificate

active

07034314

ABSTRACT:
A projection apparatus includes a charged particle beam source, a reduction lens, a charged particle shaping aperture having an arcuate opening, a collimator lens, and first and second projection lenses. A charged particle beam emerging from the charged particle beam source irradiates a mask placed on a mask stage to transfer a pattern on the mask onto a sample on a sample stage. The first and second projection lenses can move their first and second principal plane positions with an excitation strength ratio control circuit.

REFERENCES:
patent: 3644700 (1972-02-01), Kruppa et al.
patent: 4198569 (1980-04-01), Takayama
patent: 4389571 (1983-06-01), Crewe
patent: 4469949 (1984-09-01), Mori et al.
patent: 4544847 (1985-10-01), Taylor
patent: 4560879 (1985-12-01), Wu et al.
patent: 4812662 (1989-03-01), Goto et al.
patent: 4939371 (1990-07-01), Goto
patent: 4954717 (1990-09-01), Sakamoto et al.
patent: 5578821 (1996-11-01), Meisberger et al.
patent: 5864142 (1999-01-01), Muraki et al.
patent: 5929454 (1999-07-01), Muraki et al.
patent: 6225637 (2001-05-01), Terashima et al.
patent: 6555824 (2003-04-01), Feuerbaum et al.
patent: 6633366 (2003-10-01), de Jager et al.
patent: 0 838 837 (1998-04-01), None

Affiliated with

Also associated with

Rating

Projection apparatus for projecting a pattern formed on a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection apparatus for projecting a pattern formed on a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection apparatus for projecting a pattern formed on a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3567814