Projection apparatus

Details Projection apparatus Projection apparatus

1988-07-13

1991-03-12

Haroian, Harry N.

Optics: image projectors

Miscellaneous

353101, G03B 2734

Patent

active

049988212

ABSTRACT:
A projection apparatus for projecting through an optical system a circuit pattern formed on a mask or reticle onto a wafer. Ambient or environment conditions of the apparatus, such as an atmospheric pressure, temperature and humidity are detected and, on the basis of the results of detection, any focus error and magnification error upon pattern projection on the wafer are corrected.

REFERENCES:
patent: 3722996 (1973-03-01), Fox
patent: 4084903 (1978-04-01), Pircher
patent: 4420233 (1983-12-01), Nomoto
patent: 4496239 (1985-01-01), Isohata
patent: 4690528 (1987-09-01), Tanimoto et al.
Fotolithografie, Berlin 1974, p. 186.

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