Projection aligner for fabricating semiconductor device having p

Details Projection aligner for fabricating semiconductor device having p Projection aligner for fabricating semiconductor device having p

1988-12-28

1990-07-17

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1100

Patent

active

049417452

ABSTRACT:
A projection aligner having a projection optics which project circuit patterns of reticles on a wafer next by step, comprising an X-Y stage mounting the wafer and moved to an X or Y direction by a stage controller, a developer for developing an alignment mark projected on the wafer by the projection optics, an alignment mark detector being disposed on the projection optics, and a correcting arrangement for an offset error of the alignment mark detector by measuring the offset error of a zero point after the wafer is projected with an alignment mark by the projection optics, the alignment mark is developed by the developer and the developed alignment mark on the wafer is moved to is detection area which is previously set based on design data keeping the wafer fixed on the X-Y stage. The offset error is measured as moving distance of X-Y stage and adjust the stage controller or zero point of the alignment mark detector in order to project actual circuit patterns on the wafer correctly.

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