Projecting exposure apparatus

Details Projecting exposure apparatus Projecting exposure apparatus

2005-12-27

2005-12-27

Schwartz, Jordan M. (Department: 2873)

Optical: systems and elements

Lens

With field curvature shaping

C359S619000, C359S663000

Reexamination Certificate

active

06980366

ABSTRACT:
A spatial light modulator has pixel sections for performing spatial light modulation of light. An image-side telecentric image forming optical system forms an image of a two-dimensional pattern of the light having been obtained from the spatial light modulation. A microlens array having microlenses arrayed in two-dimensional directions is located in the vicinity of a plane of image formation of the two-dimensional pattern, whose image is formed by the image forming optical system. A magnification adjusting optical system for adjusting a magnification of image formation at the time of the formation of the image of the two-dimensional pattern of the light with the image forming optical system is located between the image forming optical system and the microlens array.

REFERENCES:
patent: 5808986 (1998-09-01), Jewell et al.
patent: 6344929 (2002-02-01), Sugawara
patent: 6433934 (2002-08-01), Reznichenko et al.
patent: 2001-305663 (2001-11-01), None

Affiliated with

Also associated with

Rating

Projecting exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projecting exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projecting exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3468766