Progressive self-learning defect review and classification...

Details Progressive self-learning defect review and classification... Progressive self-learning defect review and classification...

2007-01-09

2007-01-09

Mancuso, Joseph (Department: 2624)

Image analysis

Applications

Manufacturing or product inspection

Reexamination Certificate

active

10326499

ABSTRACT:
A progressive self-learning (PSL) method is provided for enhancing wafer or mask defect inspection review and classification by identifying a plurality of wafer or mask defects, and by classifying each of the plurality of defects according to an extent of resemblance of each defect. The method having the steps of: performing image processing on a scanned defect image; aligning the scanned defect image with a just-stored digitized defect image; matching the scanned defect image with a just-stored digitized defect image; and classifying the scanned defect image.

REFERENCES:
patent: 4736437 (1988-04-01), Sacks et al.
patent: 6292582 (2001-09-01), Lin et al.

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