Programming power paths in an IC by combined depletion and enhan

Metal working – Method of mechanical manufacture – Assembling or joining

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Details

29571, 29577C, 148 15, 148187, 357 234, 357 91, H01L 21263, H01L 2180

Patent

active

046335722

ABSTRACT:
An enhancement implant used in late programming of a ROM in an integrated circuit is combined with a depletion implant used much earlier in the fabrication process to also permit late programming of power paths in the integrated circuit. The implants must be matched and the IC heated after the enhancement implant.

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