Programming an IGFET read-only-memory

Metal working – Method of mechanical manufacture – Assembling or joining

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29571, 148 15, 148187, 357 23, 357 45, 357 91, B01J 1700, G11C 1140, G11C 1700, H01L 21263

Patent

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043641679

ABSTRACT:
An IGFET ROM is programmed late in its process of manufacture. An array of IGFETs having an operable channel region and gate electrode is provided. The gate electrode is penetrable by an ion beam. A first dielectric penetrable by the ion beam is deposited onto the array. A second dielectric not penetrable by the ion beam is then deposited onto the array. Windows are then etched into the second dielectric material but not the first, over channel regions of selected IGFETs. The wafer surface is given an ion implantation to change threshold voltage of those IGFETs selected. A metallization pattern is formed on the second dielectric, with the first dielectric providing an insulating coating for gate electrode portions otherwise exposed within the aforementioned windows.

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