Programmed material consolidation methods for fabricating...

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – With provision for cooling the housing or its contents

Reexamination Certificate

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C257S713000, C257S717000, C257S721000, C438S122000, C438S121000, C438S123000, C438S125000

Reexamination Certificate

active

11053724

ABSTRACT:
Programmed material consolidation processes for fabricating heat sinks include the selective consolidation of previously unconsolidated material. The heat dissipation element of the heat sink that has been fabricated by such processes can have non-linear or convoluted passageways therethrough to enhance air flow. An optical recognition system may be used in conjunction with programmed material consolidation processes to ensure that a heat sink is fabricated or positioned on the appropriate location of an electronic component, such as a semiconductor device.

REFERENCES:
patent: 4526646 (1985-07-01), Suzuki et al.
patent: 4543659 (1985-09-01), Ozaki
patent: 4736437 (1988-04-01), Sacks et al.
patent: 4863538 (1989-09-01), Deckard
patent: 4899921 (1990-02-01), Bendat et al.
patent: 4944817 (1990-07-01), Bourell et al.
patent: 5017753 (1991-05-01), Deckard
patent: 5059559 (1991-10-01), Takahashi et al.
patent: 5088047 (1992-02-01), Bynum
patent: 5113565 (1992-05-01), Cipolla et al.
patent: 5132143 (1992-07-01), Deckard
patent: 5145099 (1992-09-01), Wood et al.
patent: 5155321 (1992-10-01), Grube et al.
patent: 5155324 (1992-10-01), Deckard et al.
patent: 5156697 (1992-10-01), Bourell et al.
patent: 5173220 (1992-12-01), Reiff et al.
patent: 5182170 (1993-01-01), Marcus et al.
patent: 5238174 (1993-08-01), Ricketson et al.
patent: 5252264 (1993-10-01), Forderhase et al.
patent: 5264061 (1993-11-01), Juskey et al.
patent: 5278442 (1994-01-01), Prinz et al.
patent: 5284695 (1994-02-01), Barlow et al.
patent: 5288698 (1994-02-01), Banjo et al.
patent: 5304329 (1994-04-01), Dickens, Jr. et al.
patent: 5316580 (1994-05-01), Deckard
patent: 5325265 (1994-06-01), Turlik et al.
patent: 5332051 (1994-07-01), Knowlton
patent: 5342919 (1994-08-01), Dickens, Jr. et al.
patent: 5352405 (1994-10-01), Beaman et al.
patent: 5385780 (1995-01-01), Lee
patent: 5430666 (1995-07-01), DeAngelis et al.
patent: 5463227 (1995-10-01), Stern et al.
patent: 5471310 (1995-11-01), Spigarelli et al.
patent: 5484314 (1996-01-01), Farnworth
patent: 5506684 (1996-04-01), Ota et al.
patent: 5516023 (1996-05-01), Kono
patent: 5516026 (1996-05-01), Arlye et al.
patent: 5527877 (1996-06-01), Dickens, Jr. et al.
patent: 5644245 (1997-07-01), Saitoh et al.
patent: 5645937 (1997-07-01), Noda et al.
patent: 5648450 (1997-07-01), Dickens, Jr. et al.
patent: 5672312 (1997-09-01), Almquist et al.
patent: 5673258 (1997-09-01), Helbig et al.
patent: 5693981 (1997-12-01), Schneider et al.
patent: 5705117 (1998-01-01), O'Connor et al.
patent: 5733497 (1998-03-01), McAlea et al.
patent: 5749041 (1998-05-01), Lakshminarayan et al.
patent: 5814536 (1998-09-01), Rostoker et al.
patent: 5817206 (1998-10-01), McAlea et al.
patent: 5895971 (1999-04-01), Nakanishi
patent: 5900670 (1999-05-01), Schneider et al.
patent: 5981085 (1999-11-01), Ninomiya et al.
patent: 6015722 (2000-01-01), Banks et al.
patent: 6019165 (2000-02-01), Batchelder
patent: 6111313 (2000-08-01), Kutlu
patent: 6175497 (2001-01-01), Tseng et al.
patent: 6251488 (2001-06-01), Miller et al.
patent: 6259962 (2001-07-01), Gothait
patent: 6268584 (2001-07-01), Keicher et al.
patent: 6274922 (2001-08-01), Choudhury et al.
patent: 6296493 (2001-10-01), Michiya
patent: 6391251 (2002-05-01), Keicher et al.
patent: 6457515 (2002-10-01), Vafai et al.
patent: 6468891 (2002-10-01), Williams
patent: 6529379 (2003-03-01), Fuller et al.
patent: 6658314 (2003-12-01), Gothait
patent: 2002/0171177 (2002-11-01), Kritchman et al.
patent: 2003/0151167 (2003-08-01), Kritchman et al.
Miller et al., “Maskless Mesoscale Materials Deposition”, Deposition Technology, Sep. 2001, pp. 20-22.
Miller, “New Laser-Directed Deposition Technology”, Microelectronic Fabrication, Aug. 2001, 1 page.
Webpage, Photopolymer Materials and Support Resins, Objet FullCure700 Series (2003), 2 pages.
Webpage, Objet Prototyping the Future, How it Works (2003), 2 pages.

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