Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2006-11-21
2006-11-21
Trinh, Minh (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S825000, C029S831000, C029S846000, C438S597000, C438S598000, C438S106000
Reexamination Certificate
active
07137193
ABSTRACT:
Methods for fabricating semiconductor device components include use of programmed material consolidation processes to form the substrates or conductive elements thereof. The features that are formed by such processes may include multiple adjacent, mutually adhered regions. A machine vision system may be used so that the programmed material consolidation system may recognize the position, orientation, and features of a semiconductor device assembly, semiconductor die, or other substrate on which an element is to be fabricated.
REFERENCES:
patent: 4042861 (1977-08-01), Yasuda et al.
patent: 4138672 (1979-02-01), Kepchar
patent: 4511595 (1985-04-01), Inoue
patent: 4526807 (1985-07-01), Auerbach
patent: 4578155 (1986-03-01), Halliwell et al.
patent: 4610941 (1986-09-01), Sullivan
patent: 4695258 (1987-09-01), Hanson et al.
patent: 4747670 (1988-05-01), Devio et al.
patent: 4752498 (1988-06-01), Fudim
patent: 4891635 (1990-01-01), Hata
patent: 4954873 (1990-09-01), Lee et al.
patent: 5007576 (1991-04-01), Congleton et al.
patent: 5059899 (1991-10-01), Farnworth
patent: 5079974 (1992-01-01), Weiss et al.
patent: 5141680 (1992-08-01), Almquist et al.
patent: 5173220 (1992-12-01), Reiff et al.
patent: 5174943 (1992-12-01), Hull
patent: 5264061 (1993-11-01), Juskey et al.
patent: 5278442 (1994-01-01), Prinz et al.
patent: 5344298 (1994-09-01), Hull
patent: 5461769 (1995-10-01), McGregor
patent: 5477082 (1995-12-01), Buckley, III et al.
patent: 5484314 (1996-01-01), Farnworth
patent: 5501824 (1996-03-01), Almquist et al.
patent: 5510066 (1996-04-01), Fink et al.
patent: 5541367 (1996-07-01), Swamy
patent: 5545367 (1996-08-01), Bae et al.
patent: 5569349 (1996-10-01), Almquist et al.
patent: 5668405 (1997-09-01), Yamashita
patent: 5672312 (1997-09-01), Almquist et al.
patent: 5676904 (1997-10-01), Almquist et al.
patent: 5695707 (1997-12-01), Almquist et al.
patent: 5705117 (1998-01-01), O'Connor et al.
patent: 5776409 (1998-07-01), Almquist et al.
patent: 5807767 (1998-09-01), Stroupe
patent: 5834844 (1998-11-01), Akagawa et al.
patent: 5855063 (1999-01-01), Schreiber et al.
patent: 5855836 (1999-01-01), Leyden et al.
patent: 5903662 (1999-05-01), DeCarlo
patent: 5925931 (1999-07-01), Yamamoto
patent: 5962918 (1999-10-01), Kimura
patent: 5969424 (1999-10-01), Matsuki et al.
patent: 6046882 (2000-04-01), Pattanaik et al.
patent: 6063641 (2000-05-01), Seki
patent: 6081430 (2000-06-01), La Rue
patent: 6096574 (2000-08-01), Smith
patent: 6159767 (2000-12-01), Eichelberger
patent: 6251488 (2001-06-01), Miller et al.
patent: 6259962 (2001-07-01), Gothait
patent: 6268584 (2001-07-01), Keicher et al.
patent: 6296493 (2001-10-01), Michiya
patent: 6312263 (2001-11-01), Higuchi et al.
patent: 6391251 (2002-05-01), Keicher et al.
patent: 6468891 (2002-10-01), Williams
patent: 6524346 (2003-02-01), Farnworth
patent: 6529027 (2003-03-01), Akram et al.
patent: 6531335 (2003-03-01), Grigg
patent: 6537842 (2003-03-01), Akram
patent: 6611053 (2003-08-01), Akram
patent: 6630730 (2003-10-01), Grigg
patent: 6634100 (2003-10-01), Akram et al.
patent: 6764933 (2004-07-01), Williams
patent: 6815253 (2004-11-01), Williams
patent: 2002/0171177 (2002-11-01), Krichman et al.
patent: 2003/0068840 (2003-04-01), Grigg
patent: 2003/0102566 (2003-06-01), Farnworth
patent: 2003/0141885 (2003-07-01), Akram et al.
patent: 2003/0151167 (2003-08-01), Kritchman et al.
patent: 2003/0180974 (2003-09-01), Akram
patent: 2003/0181003 (2003-09-01), Akram
patent: 2003/0186496 (2003-10-01), Akram
patent: 2004/0032020 (2004-02-01), Akram
patent: 2004/0034996 (2004-02-01), Akram et al.
patent: 0 493 307 (1992-07-01), None
patent: 63-160351 (1988-07-01), None
patent: 4-242947 (1992-08-01), None
patent: 2001-217614 (2001-08-01), None
Miller, Doyle, “New Laser-Directed Deposition Technology,” HDI, p. 16 (Aug. 2001).
Miller, Doyle, et al., “Maskless Mesoscale Materials Deposition,” HDI, pp. 20-22 (Sep. 2001).
Webpage, Objet Prototyping the Future, Objet FullCure700 Series, 2 pages.
Webpage, Objet Prototyping the Future, How it Works, 2 pages.
Micro)n Technology, Inc.
TraskBritt
Trinh Minh
LandOfFree
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