Programmable non-volatile resistance switching device

Active solid-state devices (e.g. – transistors – solid-state diode – Bulk effect device – Bulk effect switching in amorphous material

Reexamination Certificate

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C257S005000, C365S148000

Reexamination Certificate

active

07465952

ABSTRACT:
A memory element comprises a first number of electrodes and a second number of electrically conducting channels between sub-groups of two of said electrodes, the channels exhibiting an electrical resistance that is reversibly switchable between different states, wherein the first number is larger than two and the second number is larger than the first number divided by two. The electrically conducting channels may be provided in transition metal oxide material, which exhibits a reversibly switchable resistance that is attributed to a switching phenomenon at the interfaces between the electrodes and the transition metal oxide material.

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Beck et al., “Reproducible Switching Effect in Thin Oxide Films for Memory Applications”, Applied Physics Letters, AIP, American Institute of Physics, Melville, NY, US, vol. 77, No. 1, Jul. 3, 2000, pp. 139-141.
Baikalov et al., “Field-Driven Hysteretic and Reversible Resistive Switch at the AG-PRO.7CAO.3MNO3 Interface”, Applied Physics Letters, AIP, American Institute of Physics, Melville, NY, US, vol. 83, No. 5, Aug. 4, 2003, pp. 957-959.
Tsui et al., “Field-Induced Resistive Switching in Metal-Oxide Interfaces”, Applied Physics Letters, AIP, American Institute of Physics, Melville, NY, US, vol. 85, No. 2, Hul. 12, 2004, pp. 317-319.

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