Programmable method for cleaning semiconductor elements

Details Programmable method for cleaning semiconductor elements Programmable method for cleaning semiconductor elements

1993-12-22

1999-01-26

Hastings, Karen M.

Cleaning and liquid contact with solids

Processes

Combined

134 2, 134 19, 134 33, B08B 704

Patent

active

058633480

ABSTRACT:
Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.

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ACCEL "Microcel Centrifugal Cleaning Systems" (1989) (no month avail).

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