Programmable method and apparatus for cleaning semiconductor ele

Details Programmable method and apparatus for cleaning semiconductor ele Programmable method and apparatus for cleaning semiconductor ele

1995-04-27

1998-02-10

Bennett, Henry A.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

F26B 1724

Patent

active

057156107

ABSTRACT:
Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.

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