Programmable apparatus for cleaning semiconductor elements

Details Programmable apparatus for cleaning semiconductor elements Programmable apparatus for cleaning semiconductor elements

1995-04-27

1997-09-16

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

134902, 134200, 134155, 1341022, 134 952, B08B 302

Patent

active

056669852

ABSTRACT:
Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.

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