Production of thin, stable, solid electrolyte films of high ioni

Details Production of thin, stable, solid electrolyte films of high ioni Production of thin, stable, solid electrolyte films of high ioni

1975-07-28

1978-08-08

Esposito, Michael F.

Coating processes

Electrical product produced

Metallic compound coating

204192C, 427248R, 427255, 429191, 204192SP, C23C 1500, C23C 1108

Patent

active

041058070

ABSTRACT:
Production of thin stable films of oxy-anion-substituted silver iodide solid electrolytes, such as Ag.sub.19 I.sub.15 P.sub.2 O.sub.7, on a substrate, such films having good ionic conductivity at room temperature, by vaporizing such oxy-anion-substituted silver iodide elecytrolyte material, or a mixture of the components thereof in stoichiometric proportions, by flash evaporation of such electrolyte material at high temperature, preferably ranging from about 1,400.degree. to about 1,600.degree. C., or by RF sputtering, preferably at electrode potentials ranging from about 700 to about 900 volts, and maintaining the substrate on which the solid electrolyte film is deposited, at certain elevated temperatures, preferably ranging from about 140.degree. to about 150.degree. C., to permit recombination and deposition of the vaporized constituents of the electrolyte material on the substrate, to form a thin film of the solid electrolyte such that the solid electrolyte film thus formed is neither iodine-rich nor iodine-poor, relative to the proper stoichiometry for such solid electrolyte.

REFERENCES:
takahashi et al., Solid-State Ionics-Solids with High Ionic Conductivity in Systems Silver Iodide-Silver Oxyacid Salts in J. Electrochem. Soc. 119(4): pp. 477-482, Apr. 1972.
Kennedy et al., Preparation of Vacuum-Deposited Films of Rubidium Silver Iodide, in J. Electrochem Soc., 120(3): pp. 454-458, Mar. 1973.

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