Production of tetrafluorosilane

Details Production of tetrafluorosilane Production of tetrafluorosilane

2006-07-11

2006-07-11

Johnson, Edward M. (Department: 1754)

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

Reexamination Certificate

active

07074377

ABSTRACT:
Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a high valent metal fluoride, or a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas and a step (2-3) of reacting a tetrafluorosilane gas produced in the step (2-1) with a high valent metal fluoride. Further, impurities in high-purity tetrafluorosilane are analyzed.

REFERENCES:
patent: 3453079 (1969-07-01), Langer
patent: 4382071 (1983-05-01), Otsuka et al.
patent: 4457901 (1984-07-01), Kitsugi et al.
patent: 4615872 (1986-10-01), Porcham
patent: 5145507 (1992-09-01), Kyoto et al.
patent: WO 00/76915 (2000-12-01), None

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