Chemistry: physical processes – Physical processes – Crystallization
Patent
1988-07-22
1990-04-10
Stoll, Robert L.
Chemistry: physical processes
Physical processes
Crystallization
423339, 423357, 423470, 423471, 423490, 423499, C01D 324
Patent
active
049157051
ABSTRACT:
A process for producing high grade silica and fluorine-containing coproducts from fluosilicic acid is described. To produce silica, the fluosilicic acid is reacted with aqueous ammonia to produce a solid silica product and a solution of ammonium fluoride. The solid silica is washed under controlled conditions and further processed to produce a high grade product. The ammonium fluoride solution is concentrated and sold as a concentrated ammonium fluoride solution product or reacted with metal hydoxides or oxides to produce metal fluorides.
REFERENCES:
patent: 2780522 (1957-02-01), Gloss et al.
patent: 3021194 (1962-02-01), Cunningham
patent: 3024086 (1962-03-01), Cines
patent: 3111384 (1963-11-01), Heckathorn et al.
patent: 3271107 (1966-09-01), Nickerson et al.
patent: 3549317 (1970-12-01), Dorn et al.
patent: 4026997 (1977-05-01), Schneider et al.
patent: 4057614 (1977-11-01), Ono et al.
patent: 4062929 (1977-12-01), Thompson et al.
patent: 4264563 (1981-04-01), Sikdar
patent: 4308244 (1981-12-01), Sikdar et al.
patent: 4613494 (1986-09-01), Barber
patent: 4623521 (1986-11-01), Gravley et al.
Astley Vivian C.
Mollere Phillip D.
Murray Michael A.
Thornsberry, Jr. Willis L.
Wiewiorowski Tadeusz K.
Freeport Research and Engineering Co.
Kunemund Robert M.
Stoll Robert L.
LandOfFree
Production of silica and fluorine-containing coproducts from flu does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Production of silica and fluorine-containing coproducts from flu, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of silica and fluorine-containing coproducts from flu will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2297284