Coating apparatus – Gas or vapor deposition – With treating means
Patent
1987-12-24
1989-05-23
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
423349, 423350, C23C 1600
Patent
active
048319643
ABSTRACT:
Shaped articles, e.g., bars, of semiconductor-grade, ultra-pure silicon, are facilely and efficiently produced by thermally decomposing/pyrolyzing a monosilane feedstream on a red-heated silicon support member, whereby high purity silicon is deposited thereon, and thence recycling the majority of the by-product reaction admixture into said monosilane feedstream.
REFERENCES:
patent: 3091517 (1963-05-01), Short
patent: 3147141 (1964-09-01), Ishizuka
patent: 4132763 (1979-01-01), Schmidt
patent: 4147814 (1979-04-01), Yatsurugi
patent: 4150168 (1979-04-01), Yatsurugi
patent: 4468283 (1984-08-01), Ahmed
Blocher, Proceedings of the 7th International Conf. on CVD, 1979, The Electrochemical Society, Princeton, N.J., pp. 140-158.
Boudot Bernard
Jacubert Serge
Nataf Philippe
Bueker Richard
Rhone-Poulenc Specialites Chimiques
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