Production of Schottky barrier diode

Metal working – Method of mechanical manufacture – Assembling or joining

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29591, 148187, 148188, H01L 21225

Patent

active

044147376

ABSTRACT:
A Schottky barrier diode is manufactured by first forming insulating layer on a semiconductor substrate of a first conductivity type. The insulating layer is then provided with a first opening partly exposing the substrate. Then a continuous semiconductor layer doped with an impurity of a second conductivity type is formed over the insulating layer and on the exposed surface of the substrate. The semiconductor layer is etched in the direction of thickness until those portions which lie on the insulating layer and the exposed surface of the substrate are removed, whereby a portion of the semiconductor layer remains on the side wall of the insulating layer which defines the first opening, and a second opening is formed partly exposing the substrate within the first opening. A guard ring region is then formed in a surface region of the semiconductor substrate by diffusing the impurity from the remaining doped semiconductor layer. Finally, a metal layer is formed on the exposed semiconductor substrate surface within the second opening, thus obtaining a Schottky barrier diode.

REFERENCES:
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patent: 3761328 (1973-09-01), Abe et al.
patent: 3764413 (1973-10-01), Kakizaki et al.
patent: 3820235 (1974-06-01), Goldman
patent: 3907617 (1975-09-01), Zwernemann
patent: 3942241 (1976-03-01), Harigaya et al.
patent: 4209350 (1980-06-01), Ho et al.
patent: 4261095 (1981-04-01), Dreves et al.
patent: 4356040 (1982-10-01), Fu et al.
patent: 4358891 (1982-11-01), Roesner

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