Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Patent
1995-02-23
1996-07-02
Straub, Gary P.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Nitrogen or nitrogenous component
423DIG10, B01D 5356
Patent
active
055319734
ABSTRACT:
A method for reducing NO.sub.x produced by the burning of fuels includes providing a hydrocarbon and nitrogen mixture to a plasma arc generator for producing NO.sub.x reducing precursors which are, in turn, provided near the burning of the fuel for reacting and reducing NO.sub.x emissions. These precursors include N, H, HCN, CH.sub.i and NH.sub.i, etc.
REFERENCES:
patent: 4878830 (1989-11-01), Henderson
patent: 4985219 (1991-01-01), Helfritch et al.
patent: 5020457 (1991-06-01), Mathur et al.
patent: 5139755 (1992-08-01), Seeker et al.
patent: 5229090 (1993-07-01), Hofmann et al.
"Removal of NO.sub.x and CH.sub.3 C1 by Reaction Methods", Industrial Heating, 1993 pp. 47-48. Feb. 1993.
Behbahani, H. F. et al., "The Destruction of Nitric Oxide by Nitrogen Atoms from Plasma Jets",Comb. Sci. & Tech. 27, 123-132, 1982.
Behbahani, H. F. et al., "The Destruction of Nitric Oxide by Nitrogen Atoms from Plasma Jets," Comb. Sci. & Tech. 30, 289-302, 1983.
Hilliard, J. C. et al., "Nitric Oxide Reduction by Radiative Cooling of Natural Gas Flames Seeded by Plasma Generated Carbon Particles," Fossil Fuels Comb. Symp., PD-vol. 25, Book No. H00453, 1989.
Edwards Robert J.
Kalka Daniel S.
Straub Gary P.
The Babcock & Wilcox Company
Vanoy Timothy C.
LandOfFree
Production of plasma generated NO.sub.x reducing precursors from does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Production of plasma generated NO.sub.x reducing precursors from, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of plasma generated NO.sub.x reducing precursors from will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1504397