Production of oxide superconducting films by laser sputtering us

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

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505732, 505730, 427 62, 427596, 427314, B05D 306, B05D 512

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active

052368955

ABSTRACT:
There is provided in a process for depositing a metal oxide superconducting film on a substrate by laser sputtering, the improvement which comprises carrying out the deposition of the metal oxide superconducting film in the presence of a gas having higher oxidation potential than oxygen.

REFERENCES:
patent: 4514437 (1985-04-01), Nath
patent: 4771015 (1988-09-01), Kanai et al.
Berkley et al "In Situ Formation of Superconducting YBa.sub.2 Cu.sub.3 O.sub.7-x Thin Films Using Pure Ozone Vapor Deposition" Appl. Phys. Lett. 53(20) Nov. 1988 pp. 1973-1975.
Kanai et al. "Formation of Bi-Sr-Ca-Cu-O Thin Films by a Laser Sputtering Method " Jpn. J. Appl. Phys. vol. 27(7) Jul. 1988 L1293-1296.
Tsuroka et al "Y-Ba-Cu-O" Film Growth by OMCVD Using N.sub.2 O Jpn. J. Appl. Phys vol. 28(10) Oct. 1989 L1800-1802.
Terashima et al "Preparation of Superconducting Y-Ba-Cu-O Films by a Reactive Plasma Evaporation Method" Appl. Phys Lett. 52(15) Apr. 1988 pp. 1274-1276.
Spah et al "Parameters for in Situ Growth of High T.sub.c Sperconducting Thin Films Using an Oxygen Plasma Source" Appl Phys. Lett. 53(5) Aug. 1988 pp. 441-443.
Kanai et al "Low-Temperature Formation of Multilayered Bi(Pb) -S r-Ca-Cu-O Thin Films by Successive Deposition Using Laser Ablation" Appl. Phys. Lett. 54(18) May 1989 pp. 1802-1804.
Witanachchi et al. "Deposition of Superconducting Y-Ba-Cu-O Films at 400.degree. C. Without Post-Annealing" Appl. Phys. Lett. 53(3) Jul. 1988 pp. 234-236.
Inam et al, "As-deposited High T.sub.c and J.sub.c Superconducting Thin Films Made at Low Temperatures," Appl. Phys. Lett. 53(10) Sep. 1988 pp. 908-910.

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