X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1981-02-12
1984-01-17
Smith, Alfred E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 84, G01B 1500
Patent
active
044267193
ABSTRACT:
The present method and apparatus produces undistorted x-ray images of sources emitting x-rays and especially of certain areas emitting x-rays. Stigmatic monochromatic x-ray images, and x-ray spectra with a spatial resolution along the lines of the spectrum are produced. The device comprises, in combination, an x-ray diffraction crystal capable of simultaneous reflection, and an x-ray point intensity measuring system, the arrangement being such that the reflection plane of the crystal makes an angle with the plane of the intensity measurement system of 90 degrees of angle minus the Bragg angle for a forbidden reflection of the crystal, and where the x-ray radiation incident on the crystal makes a Bragg angle with the plane of the forbidden reflection, the azimuthal arrangement allowing simultaneous reflection. A source of x-rays forms, by means of double reflection from a plane crystal of adequate size, a plurality of undistorted spectral images, each of which corresponds to a given wavelength of the x-ray emitter. When x-rays from a suitable source are incident on a crystal of suitable curvature, and by double reflection, a spectrum is obtained, each line corresponding to a given wavelength, the variation of density along each line being indicative of the spatial distribution of the emitter of each line in the direction of such line.
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Grigsby T. N.
Smith Alfred E.
Yissum Research Development Co. of the Hebrew University of Jeru
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