Production of microstructure elements

Details Production of microstructure elements Production of microstructure elements

1993-07-09

1994-04-12

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

264112, 264219, 427 58, 427181, 427195, 427235, 427271, 4273744, 4273855, 4273981, 427595, B05D 512

Patent

active

053024214

ABSTRACT:
A process for the production of microstructure elements having structure depths of from several .mu.m into the mm range by imagewise irradiation of polymers with X-rays and removal of the areas of the polymers which have been irradiated imagewise, comprises applying the polymers, before the imagewise irradiation, to an electroconductive substrate in a layer thickness of from several .mu.m into the mm range by melting under pressure, thus firmly anchoring the polymers.
The process according to the invention is particularly suitable for the production of microstructure elements having structure depths of from 3 to 2000 .mu.m and lateral dimensions of less than 10 .mu.m.

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