Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1997-07-14
1998-11-24
Wong, Don
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
31511121, 31511131, H05H 100
Patent
active
058412379
ABSTRACT:
Microwave injection methods for enhancing the performance of existing electron cyclotron resonance (ECR) ion sources. The methods are based on the use of high-power diverse frequency microwaves, including variable-frequency, multiple-discrete-frequency, and broadband microwaves. The methods effect large resonant "volume" ECR regions in the ion sources. The creation of these large ECR plasma volumes permits coupling of more microwave power into the plasma, resulting in the heating of a much larger electron population to higher energies, the effect of which is to produce higher charge state distributions and much higher intensities within a particular charge state than possible in present ECR ion sources.
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R. A. Dandl et al "Electron Cyclotron Heated `Target` Plasma Experiments," Plasma Phys. Controlled Nucl. Res., (1969), Proc. Intl. Conf., 3rd, Novosibirsk, 435-448.
G. D. Alton et al "Design Studies for an Advanced ECR Ion Source," Rev. Sci. Instrum., 65 (4) Apr. 1994, 775-787.
Z. Q. Xie and C. M. Lyneis, "Improvements on the LBL AECR Source," Proceedings of Twelfth Intl. Workshop on ECR Ion Sources, edited by M. Sekiguchi and T. Nakagawa, The Inst. of Physical and Chemical Res. (RIKEN) Apr. 25-27, 1995 Wakoshi, Japan, INS-J-1821995, pp. 24-28.).
Lockheed Martin Energy Research Corporation
Spicer James M.
Vu David H.
Wong Don
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