Production of gem-disubstituted cyclohexadienones

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing

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556418, 544229, 549215, C07F 718, C07F 710

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048047740

ABSTRACT:
Quinones may be perfluoroalkylated by means of perfluoroalkyltrihydrocarbyl silane using trialkylphosphites or hexahydrocarbylphosphorous triamides, or both as catalysts. The reaction --which is conducted under essentially anhydrous conditions, preferably in a suitable liquid phase reaction medium, most preferably a dipolar aprotic solvent--results in the formation of gem-disubstituted cyclohexadienones in which the gem substituents are a perfluoroalkyl group and a trihydrocarbylsiloxy group. These gem-disubstituted compounds in turn can be readily converted to perfluoroalkyl substituted aromatics, thus circumventing the traditional need for photochlorination followed by halogen exchange using hydrogen fluoride as a means of preparing perfluoroalkyl aromatic compounds.

REFERENCES:
patent: 2920092 (1960-01-01), Bailey
patent: 3472888 (1969-10-01), Bazouin et al.
patent: 4210596 (1980-07-01), Cella
patent: 4238401 (1980-12-01), Cella et al.
patent: 4360686 (1982-11-01), Wang et al.
patent: 4375548 (1983-03-01), Wang
patent: 4448980 (1984-05-01), Sogah
patent: 4634787 (1987-01-01), Wang
Fujita, et al., J. Am. Chem. Soc., 1985, 107 4085-4087.

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