Production of films of SiO.sub.2 by chemical vapor deposition

Details Production of films of SiO.sub.2 by chemical vapor deposition Production of films of SiO.sub.2 by chemical vapor deposition

1993-11-08

1997-01-14

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

4272551, 4272552, 4272553, 528 31, C23C 1600

Patent

active

055937276

ABSTRACT:
The chemical vapor deposition of hydridospherosiloxane to generate films of SiO.sub.2 at low temperatures on substrates that cannot withstand high temperatures. The chemical vapor deposition process synthesized compounds with the general formula,

REFERENCES:
patent: 3615272 (1971-10-01), Collins
patent: 5165955 (1992-11-01), Gentle
patent: 5310583 (1994-05-01), Eckstein et al.

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