Coating processes – Electrical product produced – Photoelectric
Patent
1995-12-20
1998-03-24
Weisstuch, Aaron
Coating processes
Electrical product produced
Photoelectric
427 74, 136260, 136264, 136265, 437 5, 437225, 437230, 437234, 423508, 423509, 4235611, H01L 3118
Patent
active
057310319
ABSTRACT:
A process for chemical bath deposition of selenide and sulfide salts as films and powders employable as precursors for the fabrication of solar cell devices. The films and powders include (1) Cu.sub.x Se.sub.n, wherein x=1-2 and n=1-3; (2) Cu.sub.x Ga.sub.y Se.sub.n, wherein x=1-2, y=0-1 and n=1-3; (3) Cu.sub.x In.sub.y Se.sub.n, wherein x=1-2.27, y=0.72-2 and n=1-3; (4) Cu.sub.x (InGa).sub.y Se.sub.n, wherein x=1-2.17, y=0.96-2 and n=1-3; (5) In.sub.y Se.sub.n, wherein y=1-2.3 and n=1-3; (6) Cu.sub.x S.sub.n, wherein x=1-2 and n=1-3; and (7) Cu.sub.x (InGa).sub.y (SeS).sub.n, wherein x=1-2, y=0.07-2 and n=0.663-3. A reaction vessel containing therein a substrate upon which will form one or more layers of semiconductor material is provided, and relevant solution mixtures are introduced in a sufficient quantity for a sufficient time and under favorable conditions into the vessel to react with each other to produce the resultant salt being prepared and deposited as one or more layers on the substrate and as a powder on the floor of the vessel. Hydrazine is present during all reaction processes producing non-gallium containing products and optionally present during reaction processes producing gallium-containing products to function as a strong reducing agent and thereby enhance reaction processes.
REFERENCES:
patent: 5356839 (1994-10-01), Tuttle et al.
patent: 5436204 (1995-07-01), Albin et al.
patent: 5441897 (1995-08-01), Noufi et al.
A.J. Varkey, Solar Energy Materials, vol. 19, pp. 415-420 (Dec. 1989).
G.K. Padam, Thin Solid Films, vol. 150, pp. L87-L92 (Jun. 1987).
G.K. Padam et al, Solid Energy Materials, vol. 13, pp. 297-305 (Jun. 1986).
Bhattacharya, R. N., "Solution Growth and Electrodeposited CuInSe Thin Films," J. Electrochem. Soc.; Electrochemical Science and Technology, vol. 130, No. 10, Oct. 1983, pp. 2040-2041.
Bhattacharya Raghu Nath
Noufi Rommel
Wang Li
Midwest Research Institute
O'Connor Edna M.
Richardson Ken
Weisstuch Aaron
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