Semiconductor device manufacturing: process – Manufacture of electrical device controlled printhead
Patent
1997-10-22
2000-02-08
Utech, Benjamin
Semiconductor device manufacturing: process
Manufacture of electrical device controlled printhead
438 30, 438751, 438756, 438757, 216 23, 216 27, 216 51, 216 95, H01L 21302, C30B 3300, H01B 1300
Patent
active
060227516
ABSTRACT:
A process for producing an electronic device having a silicon nitride film on a substrate is provided which comprises steps of forming a silicon nitride film and a silicon oxide film on a first face and a second face reverse to the first face of the substrate respectively, removing the silicon oxide film on the first face by wet etching, removing the silicon nitride film on the first face by wet etching, and removing the silicon oxide film on the second face by wet etching.
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patent: 4092211 (1978-05-01), Morris
patent: 5181132 (1993-01-01), Shindo et al.
patent: 5658471 (1997-08-01), Murthy et al.
Okita Akira
Shindo Hitoshi
Canon Kabushiki Kaisha
Goudreau George
Utech Benjamin
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