Production of cubic boron nitride films by laser deposition

Coating processes – Electrical product produced – Welding electrode

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427 38, 427 39, 427314, 427 50, 2041921, B05D 306

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050967401

ABSTRACT:
A highly pure cubic boron nitride film is formed on a substrate by a method which comprises irradiating an excimer laser on a target comprising boron atoms and optionally nitrogen atom and depositing cubic boron nitride on a substrate which is placed to face the target.

REFERENCES:
patent: 4683043 (1987-07-01), Melton et al.
patent: 4957773 (1990-09-01), Spencer et al.
Biunno, et al. "Low-Temperature Processing of Titanium Nitride Films by Laser Physical Vapor Deposition", Appl. Phys. Lett., vol. 54, No. 16, 17th Apr. 1989, pp. 1519-1521.
Richter, et al., "Laser Plasma Deposition and Film Structure of Covalently Bound Materials", Journal of Non-Crystalline Solids, vols. 97+98, Part II, Dec., 1987, pp. 1443-1446.
Sato, et al., "Deposition of Diamond-like Carbon Films by Pulsed-Laser Evaporation", Japanese Journal of Applied Physics/Part 2: Letters, vol. 26, No. 9, Sep., 1987, pp. L1487-L1488.
Kessler, et al., "Laser Pulse Vapour Deposition of Polycrystalline Wurtzite-type BN", Thin Solid State, vol. 147, No. 1, 16th Feb., 1987, pp. L45-L50.

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