Production of copper compounds

Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423395, 423413, 423462, 423557, C01G 302

Patent

active

053105338

ABSTRACT:
A method of producing copper compounds involves contacting metallic copper with oxygen or an oxygen-containing gas, with an aqueous solution consisting essentially of water in solution in which is a soluble ammonium salt NH.sub.4 X, where X is the anion of the salt, and with ammonia in an amount such that the solution is initially alkaline. As a result of such contact the metallic copper is initially dissolved to form a copper ammine Cu(NH.sub.3).sub.4 X and the formation of the ammine continues until the saturation concentration of the ammine is reached. Subsequently, the ammine continuously breaks down to form 3Cu(OH).sub.2.CuX.sub.2 and the water soluble products of the ammine decomposition continuously reform the amine by further reaction with the metallic copper and the oxygen on oxygen-containing gas.

REFERENCES:
patent: 1937728 (1933-12-01), Storch
patent: 2104754 (1938-01-01), Marsh et al.
patent: 2536096 (1951-01-01), Rowe
patent: 2817579 (1957-12-01), Drapeau et al.
patent: 3760070 (1973-09-01), Joice et al.
patent: 3961908 (1976-06-01), Touro
patent: 4944935 (1990-07-01), Langner et al.
Translation of V. F. Travkin et al., "Copper Extraction from Ammoniacal Solutions," from Zhurnal Pirkladnoi Khimii, vol. 56, No. 8, pp. 1730-1734, Aug. 1983.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Production of copper compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Production of copper compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of copper compounds will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2411510

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.