Production of chlorine dioxide having low chlorine content

Chemistry of inorganic compounds – Halogen or compound thereof – Chlorine dioxide

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423241, 423475, 423499, C01B 1102

Patent

active

042161959

ABSTRACT:
The proportion of chlorine dioxide to chlorine in aqueous solutions formed from gaseous mixtures of chlorine dioxide and chlorine is improved over conventional separation techniques. The gaseous product stream from a chlorine dioxide generator is scrubbed with an aqueous salt mixture containing an approximately stoichiometric quantity of sodium hydroxide, which reacts preferentially with the chlorine, yielding chlorine dioxide of high purity. The absorption system is operated under such conditions that the chlorine is converted to sodium chlorate and sodium chloride, which may then be recirculated to the chlorine dioxide generating system. The scrubbing salt solution is adjusted so as to produce an R-2 mixture upon reaction with the chlorine in the chlorine/chlorine dioxide stream.

REFERENCES:
patent: 2036311 (1936-04-01), White
patent: 2731329 (1956-01-01), Kamlet
patent: 2863722 (1958-12-01), Rapson
patent: 2963219 (1960-05-01), Rapson
patent: 3056656 (1962-10-01), Nicolaisen
patent: 3823225 (1974-07-01), Sprague
patent: 3920801 (1975-11-01), Grotheer
Sconce, "Chlorine-Its Manufacture, Properties & Uses", Reinhold Publishing Corp., New York, 1967, p. 538.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Production of chlorine dioxide having low chlorine content does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Production of chlorine dioxide having low chlorine content, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of chlorine dioxide having low chlorine content will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2280273

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.