Production of argon

Details Production of argon Production of argon

1996-07-01

1997-12-02

Kilner, Christopher

Refrigeration

Cryogenic treatment of gas or gas mixture

Separation of gas mixture

62924, F25J 304

Patent

active

056923988

ABSTRACT:
A first stream of argon-enriched oxygen is separated in a first rectification column to form oxygen vapour further enriched in argon and a second stream of argon-enriched oxygen is introduced into a second rectification column operating at a lower pressure than the first rectification column. A vapour flow upwardly through the second rectification column is created by reboiling in a reboiler-condenser liquid separated therein. The further-enriched oxygen vapour is condensed in the reboiler-condenser by indirect heat exchange with said separated liquid. One stream of the condensed further-enriched oxygen vapour is employed as reflux in the first rectification column. A third argon-enriched oxygen stream is introduced in liquid state into an intermediate mass exchange region of the second rectification column. An argon product is separated in the second rectification column. The argon concentration of the third stream is greater than that of the second stream but less than that of the argon product, and the third stream is taken from the condensed further-enriched oxygen vapour or from other liquid in the first rectification column.

REFERENCES:
patent: 4983194 (1991-01-01), Hopkins et al.
patent: 5161380 (1992-11-01), Cheung
patent: 5426946 (1995-06-01), Corduan et al.
patent: 5505051 (1996-04-01), Darredeau et al.
patent: 5572874 (1996-11-01), Rathbone

Affiliated with

Also associated with

Rating

Production of argon does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Production of argon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of argon will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-793837