Compositions – Preservative agents – Anti-oxidants or chemical change inhibitants
Patent
1978-07-14
1979-04-10
Douglas, Winston A.
Compositions
Preservative agents
Anti-oxidants or chemical change inhibitants
201 31, 432 15, C01B 3110, B01J 2118
Patent
active
041487524
ABSTRACT:
In the production of activated carbon by passing a preheated gaseous activation medium through a zone containing a bed of carbon-containing material while indirectly heating to maintain a temperature of about 500.degree. to 1100.degree. C., supplying carbon-containing material to the bed, and removing activated carbon from the bed, the improvement which comprises introducing the activation medium and the carbon-containing material co-current near the bottom of the zone at a rate such that gaseous products are formed in a quantity sufficient to maintain in the zone a lower static layer and an upper fluidized layer in particular proportions, the rate of supply of the carbon-containing material and withdrawal of activated carbon being related so as to convert about 30 to 55% by weight of the carbon-containing material to gaseous products. The average residence of the carbon-containing material is from about 0.2 to 6, preferably 1 to 4, hours. A suitable apparatus for carrying out the process is described.
REFERENCES:
patent: 2933454 (1960-04-01), Repik et al.
patent: 3565827 (1971-02-01), Friday
patent: 3910849 (1975-10-01), Kawabata et al.
patent: 4039290 (1977-08-01), Inada et al.
Burger Alex
Guth Hans
Ludovici Werner
Rohe Hermann
Bayer Aktiengesellschaft
Douglas Winston A.
Konopka P. E.
LandOfFree
Production of activated carbon in a reactor having a lower stati does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Production of activated carbon in a reactor having a lower stati, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of activated carbon in a reactor having a lower stati will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1070156