Production method of optical synthetic quartz glass, optical...

Details Production method of optical synthetic quartz glass, optical... Production method of optical synthetic quartz glass, optical...

2006-09-26

2006-09-26

Hoffmann, John (Department: 1731)

Glass manufacturing

Processes

Glass preform treating

C065S117000

Reexamination Certificate

active

07111477

ABSTRACT:
An object is to provide a method for producing an optical synthetic quartz glass and an optical synthetic glass, having a birefringence of lower than 0.5 nm/cm and having favorable refractive index distribution, yet without lowering the productivity, as well as to provide an annealing furnace suitably used in practicing said method. In a step of raising the temperature of a columnar optical synthetic quartz glass preform to a temperature of from 800° C. to 1200° C., and after keeping for a definite time, lowering the temperature, the temperature is lowered with a temperature difference of from 1 to 20° C. between the temperature of the light transmitting surface of the optical synthetic quartz glass preform and the temperature of the outer peripheral side surface of the optical synthetic quartz glass preform at temperature-lowering rates of from 2 to 50° C./hour, respectively.

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Patent Abstracts of Japan (EPO) for JP 2001-220159; Aug. 14, 2001.

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