Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-08-09
1999-03-16
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
058828257
ABSTRACT:
The present invention is directed to a method of producing a phase shift photomask having a shifter pattern comprising SOG having a transmittance high-enough to be usable with ultraviolet radaition such as KrF (of 248 nm wavelength) used for transfer onto wafers by forming an acid generator-containing SOG directly into plate to form an SOG shifter pattern. This production method at least comprises steps of coating an acid generator-containing SOG on a photomask substrate, selectively irradiating the thus coated SOG layer with ionizing radiation, and developing the SOG layer with a suitable solvent to form a shifter pattern comprising said SOG, and further includes a step of irradiating the overall surface of the thus formed SOG shifter pattern with ultraviolet radiation and/or heating the thus formed SOG shifter pattern at a high temperature to decompose a photosensitive group absorbing ultraviolet radiation, thereby making the SOG layer transparent to ultraviolet radiation used to transfer said SOG layer onto a wafer.
REFERENCES:
patent: 5556724 (1996-09-01), Tarumoto et al.
Dai Nippon Printing Co. Ltd.
Rosasco S.
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