Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-07-19
2005-07-19
Letscher, Geraldine (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C216S012000
Reexamination Certificate
active
06919147
ABSTRACT:
The present invention provides a production method for a halftone phase mask which has an SiO2substrate, an overlying refractory metal SixNyphase shifter layer (2) and an overlying chromium oxide or chromium mask layer (3), having the following steps: provision of a mask (4) on the chromium oxide or chromium mask layer (3); etching of the chromium oxide or chromium mask layer (3) for the purpose of forming a hard mask from the chromium oxide or chromium mask layer (3) in a first etching step; selective etching of the refractory metal SixNyphase shifter layer (2) using the hard mask in a plasma with a chlorine-containing and/or hydrogen-chloride-containing main gas in a second etching step with a predetermined cathode power of at least 20 W.
REFERENCES:
patent: 6045954 (2000-04-01), Dai et al.
Mathuni Josef
Ruhl Gunther
Infineon - Technologies AG
Jenkins & Wilson & Taylor, P.A.
Letscher Geraldine
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