Production method, design method and design system for...

Computer-aided design and analysis of circuits and semiconductor – Integrated circuit design processing – Physical design processing

Reexamination Certificate

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C716S104000, C716S106000, C716S108000, C716S110000, C716S111000, C716S132000, C716S134000, C703S013000, C703S014000

Reexamination Certificate

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07958478

ABSTRACT:
A production method for a semiconductor integrated circuit includes: creating a model parameter of an element constituting a cell, wherein the model parameter is defined by a design value and a distribution function of variability from the design value; performing a circuit simulation using the model parameter to create a response function that expresses response of cell characteristic to the model parameter; and creating a statistical cell library by using the response function. The statistical cell library used for circuit design and verification gives an expected value and statistical variation of the cell characteristic. The statistical variation is expressed by a product of the distribution function and sensitivity. The sensitivity is calculated based on the response function. When the model parameter is updated, the statistical cell library is updated by using the post-update model parameter and the response function without performing a circuit simulation.

REFERENCES:
patent: 6915249 (2005-07-01), Sato et al.
patent: 7239997 (2007-07-01), Yonezawa
patent: 2005/0065765 (2005-03-01), Visweswariah
patent: 2007/0198235 (2007-08-01), Takeuchi
patent: 2000-181944 (2000-06-01), None
patent: 2005-92885 (2005-04-01), None
patent: WO 02/059740 (2002-08-01), None
Kiyoshi Takeuchi, et al., “A Highly Efficient Statistical Compact Model Parameter Extraction Scheme”, SISPAD 2005, Sep. 1-3, 2005, pp. 135-138.

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