Product wafer junction leakage measurement using corona and a ke

Details Product wafer junction leakage measurement using corona and a ke Product wafer junction leakage measurement using corona and a ke

1997-08-05

2000-08-15

Metjahic, Safet

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

Of individual circuit component or element

324766, 3241581, 324767, G01R 3126, G01R 104

Patent

active

061042064

ABSTRACT:
Corona charge is applied to a semiconductor product wafer to reverse bias PN junctions. Measurements of voltage decay in the dark and in the light are made and combined to determine a PN junction leakage characteristic. A portion of the dark measurement is taken in the light to permit normalizing the light and dark measurements.

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patent: 5594328 (1997-01-01), Lukaszek

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