Product of vapor deposition and method of manufacturing same

Fabric (woven – knitted – or nonwoven textile or cloth – etc.) – Coated or impregnated woven – knit – or nonwoven fabric which... – Two or more non-extruded coatings or impregnations

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Details

442164, 428447, 428448, 428450, 427250, 427255, 427299, 427404, 4274071, 427411, 427412, 4274121, 4274125, B32B 904

Patent

active

057444056

DESCRIPTION:

BRIEF SUMMARY
TECHNICAL FIELD OF THE INVENTION

The present invention relates to a product of vapor deposition and a method for manufacturing the same, and specifically to a product of vapor deposition which can be improved in adhesive strength of a vapor deposited thin film and suitable to use for a fiber product or a sheet-like material formed with a vapor deposited thin film and a method for manufacturing the same.


BACKGROUND ART OF THE INVENTION

In an organic substrate, for example, a fiber product, having a vapor deposited thin film, for example, a metal vapor deposited thin film, the adhesive strength between the metal vapor deposited thin film and the fiber is unexpectedly low. Therefore, when it is washed (water washing, dry cleaning), most of the metal vapor deposited thin film falls off, and this is a problem for development in commercial goods.
In order to improve this defect, a method is performed for coating the fiber with a protecting film after vapor deposition. However, even if the protecting film is formed on the metal layer by any method, it is not a, and solution because the adhesive strength between the metal and the fiber is low. Namely, although the falling off of the metal deposited film may be temporarily suppressed, as time passes, or as the number of times of washing increases, the metal deposited film including the protecting film would be delaminated over a broad area.
On the other hand, an, fiber cloth indicating an interference color, which is made by vapor depositing a specified light interference thin film on a fiber cloth and which can be colored by light interference, was proposed by the applicant of the present invention, and it was already published (JP-A-HEI 382881).
Even in such a fiber cloth which is vapor deposited with a light interference thin film, because the light interference thin film is vapor deposited directly on surfaces of fibers exposed on a surface of the cloth, there remains a problem similar to that aforementioned, that is, a problem that the vapor deposited light interference thin film is poor in adhesive strength in a condition applied with friction or bending.


DISCLOSURE OF THE INVENTION

An object of the present invention is to solve such problems and to increase the adhesive strength of a vapor deposited thin film deposited on a surface of a fiber product (fiber cloth), or a sheet-like material or a product thereof, and ultimately to provide excellent washing resistance and abrasion resistance to the vapor deposition product.
To accomplish the above object, a product of vapor deposition according to the present invention comprises a vapor deposited thin film having a metal or an inorganic substance formed on at least a part of a surface of an organic substrate through an intermediate agent which contains at least a silicone-based resin and silicon dioxide.
In particular, as the silicon dioxide contained in the intermediate agent, one produced by plasma treatment is the most suitable. The intermediate agent is plasma treated from its surface. The silicon dioxide produced by such a plasma treatment can exist near the surface of the intermediate agent as well as it can be uniformly distributed in a dispersion condition close to a molecular order, thereby achieving a high adhesive strength for a vapor deposited thin film formed thereon. Particularly, if the intermediate agent is plasma treated so that the elemental composition of the intermediate agent is in a condition where one or more silicon atoms are present relative to two carbon atoms at least in a vicinity of the vapor deposited thin film, an extremely high adhesive strength can be realized.
Therefore, in order to provide such a high adhesive strength, a method for manufacturing a product of vapor deposition according to the present invention comprises the steps of providing a silicone-based resin on a surface of an organic substrate; performing plasma treatment on the surface of the silicone-based resin; and forming a thin film having a metal or an inorganic substance on the plasma-treated surface by

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