Processor with laminar fluid flow wick

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354322, G03D 306

Patent

active

050936786

ABSTRACT:
A processor for photosensitive material provides a processing solution to a processing chamber while the photosensitive material is advanced through the chamber. The processing solution is drained from the chamber and passes through a chute as it is returned to a sump for recirculation to the processing chamber. A laminar fluid flow wick located in the chute avoids air entrapment that would be caused by fluid freely flowing through the chute.

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