Cleaning and liquid contact with solids – Apparatus – With non-impelling fluid deflector or baffle other than...
Patent
1993-03-04
1994-07-12
Coe, Philip R.
Cleaning and liquid contact with solids
Apparatus
With non-impelling fluid deflector or baffle other than...
134902, B08B 304
Patent
active
053279212
ABSTRACT:
A processing vessel suitable for use with a washing system intended to wash a plurality of wafers. The processing vessel includes a washing solution supply source, a circulation pump, a filter, a main vessel portion provided with inlets in the bottom thereof, a boat for holding the plurality of wafers in the center area of the main vessel portion and a flow control assembly arranged between the inlets and the wafers. The flow control assembly includes a scattering plate for scattering washing solution, which is introduced into the main vessel portion through the inlets, in the horizontal direction, and guiding passages through which the washing solution introduced through the inlets is made to have a substantially laminar flow and is guided into the center area of the main vessel portion. The guiding passages are formed by intervals between side plates and the scattering plate and by a plurality of apertures in the scattering plate. These guiding passages enable most of the washing solution to positively flow through spaces between the adjacent wafers. The flow control assembly also include a flow rate reducing section for reducing the amount of the washing solution which flows along the peripheral area of the wafers.
Mokuo Shouri
Tanaka Osamu
Yokomizo Kenji
Coe Philip R.
Tokyo Electron Limited
Tokyo Electron Saga Limited
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