Processing systems and methods for semiconductor devices

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S002000, C134S003000

Reexamination Certificate

active

07851373

ABSTRACT:
Systems and methods for processing semiconductor devices are disclosed. A preferred embodiment comprises a processing method that includes providing a processing system including a first container and a second container fluidly coupled to the first container, the second container being adapted to receive and retain an overflow amount of a fluid from the first container, and disposing the fluid in the first container and a portion of the second container. The method includes providing at least one semiconductor device, disposing the at least one semiconductor device in the first container, and maintaining the fluid in the second container substantially to a first level while processing the at least one semiconductor device with the fluid.

REFERENCES:
patent: 5641383 (1997-06-01), Jun
patent: 5834349 (1998-11-01), Tseng
patent: 6000997 (1999-12-01), Kao et al.
patent: 6613693 (2003-09-01), Heo et al.
patent: 2002/0017364 (2002-02-01), Luo et al.
patent: 2002/0148485 (2002-10-01), Taft et al.
patent: 10083981 (1998-03-01), None
RD 284034A; Vertical laminar flow wafer rinsing tank includes filters for de-ionised water, upwardly directed nozzles, diffuser plate and over-flow to accept contaminated surface water; Anonymous[Anon]; Dec. 10, 1987.
“ET Series, Etch-Tech™ Fluoropolymer Cascading Process Bath,” http://www.process-technology.com/processtechnol/etchtech05.pdf, downloaded Oct. 12, 2006, 2 pp., Process Technology, Mentor, OH.
Wolf, S., et al., “Silicon Processing for the VLSI Era: vol. 1: Process Technology,” 2nd Ed., 2000, pp. 655-656, Lattice Press, Sunset Beach, CA.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Processing systems and methods for semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Processing systems and methods for semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Processing systems and methods for semiconductor devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4153713

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.