Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2006-11-09
2010-12-14
Hendricks, Keith D (Department: 1781)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C134S002000, C134S003000
Reexamination Certificate
active
07851373
ABSTRACT:
Systems and methods for processing semiconductor devices are disclosed. A preferred embodiment comprises a processing method that includes providing a processing system including a first container and a second container fluidly coupled to the first container, the second container being adapted to receive and retain an overflow amount of a fluid from the first container, and disposing the fluid in the first container and a portion of the second container. The method includes providing at least one semiconductor device, disposing the at least one semiconductor device in the first container, and maintaining the fluid in the second container substantially to a first level while processing the at least one semiconductor device with the fluid.
REFERENCES:
patent: 5641383 (1997-06-01), Jun
patent: 5834349 (1998-11-01), Tseng
patent: 6000997 (1999-12-01), Kao et al.
patent: 6613693 (2003-09-01), Heo et al.
patent: 2002/0017364 (2002-02-01), Luo et al.
patent: 2002/0148485 (2002-10-01), Taft et al.
patent: 10083981 (1998-03-01), None
RD 284034A; Vertical laminar flow wafer rinsing tank includes filters for de-ionised water, upwardly directed nozzles, diffuser plate and over-flow to accept contaminated surface water; Anonymous[Anon]; Dec. 10, 1987.
“ET Series, Etch-Tech™ Fluoropolymer Cascading Process Bath,” http://www.process-technology.com/processtechnol/etchtech05.pdf, downloaded Oct. 12, 2006, 2 pp., Process Technology, Mentor, OH.
Wolf, S., et al., “Silicon Processing for the VLSI Era: vol. 1: Process Technology,” 2nd Ed., 2000, pp. 655-656, Lattice Press, Sunset Beach, CA.
George Patricia A
Hendricks Keith D
Infineon - Technologies AG
Slater & Matsil L.L.P.
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