Processing system hot plate construction substrate

Details Processing system hot plate construction substrate Processing system hot plate construction substrate

1997-04-17

1999-07-27

Walberg, Teresa

Refrigeration

Using electrical or magnetic effect

Thermoelectric; e.g., peltier effect

62 37, 2194441, F25B 2102

Patent

active

059270772

ABSTRACT:
In a substrate thermal processing device, a temperature of a substrate can be precisely controlled within a short time by means of a hot plate oven. The substrate thermal processing device includes a substrate supporting plate for supporting the substrate, an auxiliary heating/cooling section for heating or cooling the substrate and having a Peltier effect element and disposed on a lower surface of the substrate supporting plate, and a main heating section for heating the substrate and disposed below the substrate supporting plate and the auxiliary heating/cooling section.

REFERENCES:
patent: 4389557 (1983-06-01), Devenyi et al.
patent: 5226056 (1993-07-01), Kikuchi et al.
patent: 5411076 (1995-05-01), Matsunaga et al.
patent: 5514852 (1996-05-01), Takamori et al.
patent: 5638687 (1997-06-01), Mizohata et al.
patent: 5702624 (1997-12-01), Liao et al.

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