Fluid handling – Systems – With pump
Patent
1998-08-21
2000-03-28
Michalsky, Gerald A.
Fluid handling
Systems
With pump
137614, G05D 1600
Patent
active
060418176
ABSTRACT:
An additional isolation valve is incorporated into a vacuum processing system to increase the life of the system's mechanical pump, reduce maintenance costs and downtime, prevent particle back streaming and reduce safety risks to maintenance technicians. The system has a process chamber with at least one port, a foreline valve connected to the port, and a vacuum manifold in fluid communication with the foreline valve. The mechanical pump is connected to the vacuum manifold for evacuating the contents of the process chamber. The isolation valve is connected between the foreline valve and the vacuum manifold and is operated in unison, or primarily in unison, with the foreline valve.
REFERENCES:
patent: 3759282 (1973-09-01), Kaldenback et al.
patent: 4249556 (1981-02-01), Waletzko
patent: 4396350 (1983-08-01), Kinney et al.
patent: 4563367 (1986-01-01), Sherman
patent: 4903937 (1990-02-01), Jakubiec et al.
patent: 4962726 (1990-10-01), Matsushita et al.
patent: 5090356 (1992-02-01), Nath et al.
patent: 5131460 (1992-07-01), Krueger
patent: 5469885 (1995-11-01), Nishimura
patent: 5496409 (1996-03-01), Chen
patent: 5505704 (1996-04-01), Pawelka et al.
patent: 5641455 (1997-06-01), Rosenlund et al.
patent: 5651868 (1997-07-01), Canady et al.
patent: 5669405 (1997-09-01), Engelmann
patent: 5674123 (1997-10-01), Roberson et al.
patent: 5769948 (1998-06-01), Oh et al.
Atwood Pierce
Fairchild Semiconductor Corp.
Michalsky Gerald A.
Scanlon Patrick R.
LandOfFree
Processing system having vacuum manifold isolation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Processing system having vacuum manifold isolation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Processing system having vacuum manifold isolation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1317314