Gas separation – Combined or convertible – In environmental air enclosure
Reexamination Certificate
2005-11-22
2005-11-22
Hopkins, Robert A. (Department: 1724)
Gas separation
Combined or convertible
In environmental air enclosure
C055S434200, C055S446000, C055SDIG015, C096S228000, C118S715000
Reexamination Certificate
active
06966936
ABSTRACT:
An object of the present invention is to ensure the stable operation of a vacuum pump for discharging an unused source gas and reaction byproduct gases from a low-pressure processing chamber, to recover the reaction byproducts efficiently for the effective utilization of resources and reduction of running costs. A low-pressure CVD system has a processing vessel (10) for carrying out a low-pressure CVD process for forming a copper film, a source gas supply unit (12) for supplying an organic copper compound as a source gas, such as Cu(I)hfacTMVS, into the processing vessel (10), and an evacuating system (14) for evacuating the processing vessel (10). The evacuating system (14) includes a vacuum pump (26), a high-temperature trapping device (28) disposed above the vacuum pump (26) with respect to the flowing direction of a gas, and a low-temperature trapping device (30) disposed below the vacuum pump with respect to the flowing direction of a gas. The high-temperature trapping device (28) decomposes the unused Cu(I)hfacTMVS contained in a gas sucked out of the processing vessel (10) to trap metallic copper. The low-temperature trapping device traps Cu(II)(hfac)2produced as a reaction byproduct.
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Arima Susumu
Kawano Yumiko
Kubo Ken'ichi
Yamasaki Hideaki
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Hopkins Robert A.
Tokyo Electron Limited
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