Processing system

Details Processing system Processing system

2007-12-18

2007-12-18

Mayekar, Kishor (Department: 1753)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With gas inlet structure

C029S592100

Reissue Patent

active

11055788

ABSTRACT:
A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Each insulating member has a step at its outer surface and an internal longitudinal through hole tapered to expand toward the processing chamber. The insulating members are pressed in the gas discharge holes to bring the steps into contact with shoulders formed in the sidewalls of the gas discharge holes. A part of each insulting member, as fitted in the gas discharge hole, projects from a surface of the upper electrode that faces a susceptor.

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Supplementary European Search Report, issued in connection with EP 98 91 2715, mailed May 7, 2004.
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