Processing photoreactive materials with open optical waveguides

Details Processing photoreactive materials with open optical waveguides Processing photoreactive materials with open optical waveguides

2006-05-23

2006-05-23

Connelly-Cushwa, Michelle (Department: 2874)

Optical waveguides

Planar optical waveguide

Reexamination Certificate

active

07050690

ABSTRACT:
A method of using open optical waveguides to process photoreactive materials, particularly micro-nanoscale polymer thin films and chains. The illustrative embodiment shows a block (10) etched with a series of depressions to function as waveguides (14, 18), light source holders (22), a material-containing channel (12), and fluid input/overflow receptacles (24, 26). The waveguides and channel form a network constructed in conformity with a hexagonal grid pattern. A hinged waveguide cover (28) is attached to the block. Material is placed in the channel, a photoreactive solution, usually an azobenzene dye, added to the channel, the cover closed, and the light sources activated in different combinations and for different durations. The material is thereby altered through accepting surface accumulations of dye or by undergoing intrinsic structural change.

REFERENCES:
patent: 5247268 (1993-09-01), Meise
patent: 5515464 (1996-05-01), Sheem
patent: 6246825 (2001-06-01), Kershaw

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