Processing of semiconductor components with dense processing...

Cleaning and liquid contact with solids – Processes – Including regeneration – purification – recovery or separation...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S001000, C134S001300, C134S011000, C134S012000, C134S031000

Reexamination Certificate

active

10737458

ABSTRACT:
Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternatively may be generated directly in the processing chamber. A processing agent may be added to the pressurization vessel, to the processing chamber, or to the dense fluid during transfer from the pressurization vessel to the processing chamber. The ultrasonic energy may be generated continuously at a constant frequency or at variable frequencies. Alternatively, the ultrasonic energy may be generated intermittently.

REFERENCES:
patent: 4944837 (1990-07-01), Nishikawa et al.
patent: 4992308 (1991-02-01), Sunol
patent: 5013366 (1991-05-01), Jackson et al.
patent: 5158704 (1992-10-01), Fulton et al.
patent: 5213619 (1993-05-01), Jackson et al.
patent: 5236602 (1993-08-01), Jackson
patent: 5266205 (1993-11-01), Fulton et al.
patent: 5339844 (1994-08-01), Stanford et al.
patent: 5355901 (1994-10-01), Mielnik et al.
patent: 5370740 (1994-12-01), Chao et al.
patent: 5377705 (1995-01-01), Smith, Jr. et al.
patent: 5417768 (1995-05-01), Smith, Jr. et al.
patent: 5456759 (1995-10-01), Stanford et al.
patent: 5494526 (1996-02-01), Paranjpe
patent: 5509431 (1996-04-01), Smith, Jr. et al.
patent: 5522938 (1996-06-01), O'Brien
patent: 5533538 (1996-07-01), Marshall
patent: 5733964 (1998-03-01), Johnston et al.
patent: 5783082 (1998-07-01), DeSimone et al.
patent: 5789505 (1998-08-01), Wilkinson et al.
patent: 5866004 (1999-02-01), Houck et al.
patent: 5866005 (1999-02-01), DeSimone et al.
patent: 5868856 (1999-02-01), Douglas et al.
patent: 5872257 (1999-02-01), Beckman et al.
patent: 5873948 (1999-02-01), Kim
patent: 5908510 (1999-06-01), McCullough et al.
patent: 5944996 (1999-08-01), DeSimone et al.
patent: 5976264 (1999-11-01), McCullough et al.
patent: 6024801 (2000-02-01), Wallace et al.
patent: 6092538 (2000-07-01), Arai et al.
patent: 6113708 (2000-09-01), Hopple et al.
patent: 6176895 (2001-01-01), DeSimone et al.
patent: 6224774 (2001-05-01), DeSimone et al.
patent: 6228563 (2001-05-01), Starov et al.
patent: 6240936 (2001-06-01), DeSimone et al.
patent: 6242165 (2001-06-01), Vaartstra
patent: 6270531 (2001-08-01), DeYoung et al.
patent: 6277753 (2001-08-01), Mullee et al.
patent: 6286231 (2001-09-01), Bergman et al.
patent: 6297206 (2001-10-01), Romack et al.
patent: 6306564 (2001-10-01), Mullee
patent: 6331487 (2001-12-01), Koch
patent: 6333268 (2001-12-01), Starov et al.
patent: 6344243 (2002-02-01), McClain et al.
patent: 6357142 (2002-03-01), Bergman et al.
patent: 6403544 (2002-06-01), Davenhall et al.
patent: 6454869 (2002-09-01), Cotte et al.
patent: 6500605 (2002-12-01), Mullee et al.
patent: 6506259 (2003-01-01), Romack et al.
patent: 6602349 (2003-08-01), Chandra et al.
patent: 6799587 (2004-10-01), Marshall et al.
patent: 2002/0026729 (2002-03-01), Bergman et al.
patent: 2002/0055323 (2002-05-01), McClain et al.
patent: 2002/0088477 (2002-07-01), Cotte et al.
patent: 2002/0112747 (2002-08-01), DeYoung et al.
patent: 2003/0003762 (2003-01-01), Cotte et al.
patent: 0726009 (1996-08-01), None
patent: 0 836 895 (1998-04-01), None
patent: 08-197021 (1996-08-01), None
patent: WO84/02291 (1984-06-01), None
patent: WO99/49996 (1999-10-01), None
patent: WO99/49998 (1999-10-01), None
patent: WO99/61177 (1999-12-01), None
patent: WO 00/16264 (2000-03-01), None
patent: WO 00/26421 (2000-05-01), None
patent: WO 01/21616 (2001-03-01), None
patent: WO 01/32323 (2001-05-01), None
patent: WO 01/33613 (2001-05-01), None
patent: WO 01/60534 (2001-08-01), None
patent: WO 01/87505 (2001-11-01), None
patent: WO 02/11191 (2002-02-01), None
patent: WO 02/15251 (2002-02-01), None
patent: WO 02/66176 (2002-08-01), None
patent: WO 2005/038898 (2005-04-01), None
K. Jackson, et al., “Microemulsions in Supercritical Hydrochlorofluorocarbons,” Langmuir 12(22), pp. 5289-5295 (1996).
J. Liu, et al., “Investigation of Nonionic Surfactant Dynol-604 Based Reverse Microemulsions Formed in Supercritical Carbon Dioxide,” Langmuir 17, pp. 8040-8043 (2001).
H. J. Martinez, et al., “SCCO2—Is it an Enabling Technology for the 90nm Node and Beyond?” International SeMatech slides (2002).
S. Pawat, “Novel Wafer Clean Technologies,” International SeMatech slides (2001).
G. Weibel, “Supercritical CO2for Semiconductor Applications,” Semiconductor Equipment and Materials International (2001).
J. Malloy, et al., “GC Analysis of Solvent Wash Samples,” Air Products and Chemicals, Inc. (2003).
Carpenter, B.A. et al., Supercritical Fluid Extraction and Chromatography,ACS Symposium Series 366, Apr. 5-10, 1987, Denver, CO.
Devittori, C. et al., Article at http://mpi.powerultrasonics.com/cleaning-co2,html, “Multifrequency ultrasonic Actuators with Special Application to Ultrasonic Cleaning in Liquid and Supercritical CO2”, 2001.
Enokida, Y. et al., “Ultrasound-Enhanced Dissolution of UO2 in Supercritical CO2 Containing a CO2-Philic Complexant of Tri-n-Butylphosphate and Nitric Acid”,Industrial&Engineering Chemistry Research, (2002), 41 (9), pp. 2282-2286.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Processing of semiconductor components with dense processing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Processing of semiconductor components with dense processing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Processing of semiconductor components with dense processing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3799417

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.