Processing of radiation sensitive devices

Details Processing of radiation sensitive devices Processing of radiation sensitive devices

1979-06-04

1980-12-23

Wintercorn, Richard A.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

354306, 354321, 354328, 134 57R, 134122P, 118666, 430309, 430325, 430434, G03D 1300

Patent

active

042407370

ABSTRACT:
During the processing of an image-wise exposed radiation sensitive device, such as a radiation sensitive plate for lithographic printing plate production, by contacting the device with developer liquid, a temperature sensitive member is immersed in the developer liquid. The member produces an output signal in dependence on the temperature of the developer liquid. This signal is used to control the degree to which the device is processed in a manner dependent on the temperature of the developer liquid for example by controlling the residence time of the device in the developer liquid, by controlling the degree to which the developer liquid is agitated in contact with the device, or by controlling the degree to which the device is subjected to an overall exposure to radiation prior to or during contact with the developer liquid.

REFERENCES:
patent: 2794377 (1957-06-01), Fairbank
patent: 3133490 (1964-05-01), Buck
patent: 3511160 (1970-05-01), Reusel
patent: 3623416 (1968-06-01), Anderberg
patent: 3625131 (1971-12-01), Puls
patent: 3999511 (1976-12-01), Schwandt
patent: 4081211 (1978-03-01), Shigeta et al.
patent: 4104668 (1978-08-01), Laar
patent: 4128326 (1978-12-01), Selak
patent: 4130825 (1978-12-01), Fassano
patent: 4153363 (1979-05-01), Albano

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