Processing method using fast atom beam

Details Processing method using fast atom beam Processing method using fast atom beam

1996-08-02

1997-10-14

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Polymerization of coating utilizing direct application of...

4272481, 427259, 427282, 427402, 427504, 427523, 427526, 427585, 427595, C08J 706

Patent

active

056770111

ABSTRACT:
There are disclosed a processing method and a processing apparatus using a fast atom beam to process a micro-sized structure on a desired face and portion of a workpiece having a complex shape. In this invention, an electron beam and/or a focused ion beam is applied to a surface of a workpiece to produce a masking film layer on the workpiece. After that, a fast atom beam is applied to the workpiece remove the surface layer of the workpiece where the masking film layer is not formed.

REFERENCES:
Tetsuro Nakamura et al., "Fabrication Technology of Integrated Circuit", published by Sangyo Tosho Publishing Company (Japan), 1987, pp. 21-23 (no month avail.).
Fusao Shimokawa et al., "Reactive-fast-atom beam etching of GaAs using Cl.sub.2 gas", J. Appl. Phys. 66(6), 15 Sep. 1989, published by 1989 American Institute of Physics, 1989, pp. 2613-2618.

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